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Our History

Teknek pioneered the idea of zero contamination in electronics manufacturing back in 1984. Over the years, our defect removal technology has transcended industries, becoming a trusted solution for manufacturers worldwide. From copper laminate to copper foil and beyond, our contamination removal solutions have been deployed in a wide range of applications, ensuring flawless production processes.

History of Teknek

2023

Products

Launch of our new web cleaning machine - Tek-NW3. A high-performance narrow web cleaner with sustainability principles at its core.

Products

Tek-HR 2.0; the second generation of Teknek’s innovative hand roller. Engineered to perform and built to last its “handle for life” is now backed by an industry-first ten-year warranty.

2022

The "Tekkies" are born - New brand characters that help audiences across the world understand key concepts and technologies with no (or little) words.

2021

Products

Tek-BC 20 - The next generation in Low Static, Low Strain board cleaning for the SMT sector.

2019

Products

SMT-II a new benchmark in SMT board cleaning. With Low Static Cleaning and Low Applied Pressure

2018

Products

NT™ First silicone roller to meet ANSI/ESD s20.20

Technical Research

SMT 2017 Wins the Title of ‘Innovation Award’, which presented by SMTA

Technical Research

SMT 2017 win the Title of 'EM Asia Innovation Award -- The Best Cleaning Machine'

Technical Research

SMT 2017 Machine received SMT China Award of 'The Best Cleaning Machine' at SH NEPCON, China

2017

Technical Research

Win The Best Cleaning Equipment Award at SH NEPCON

2016

Products

Nanocleen™ 20.20 – First roller to meet ANSI/ESD s20.20 2014

Technical Research

Methods for Optical Film Cleaning University of Huddersfield

Technical Research

Prosurf Fraunhofer Institute

2015

Products

UTF – First controlled “Surface” cleaning roller

Technical Research

Matteucci Award Best Paper at AMICAL

2014

Products

DLCC First dual lane SMT cleaner

Products

HVCC – first high vacuum cleaner certified to operate in high vacuum

2013

Technical Research

Clean 4 Yield OLED/OPV Holst Institute

2009

Products

Nanocleen™ roller and adhesive First silicon-free cleaning system

2005

Products

The “ECO” adhesive

2003

Products

The first sheeted adhesive

2000

Products

CM20 the first bare board cleaner for SMT

Technical Research

IQ Surf partner Dupont

1995

Products

WGCM the first web cleaner for reel to reel process

1990

Products

CH1-first cleaning head for screen printing machines

1987

Products

PC600 The first PCB machine

1985

Products

The first clean machine CM24

1984

Products

The first DCR hand roller