The first DCR hand roller
The first clean machine CM24
PC600 The first PCB machine
CH1-first cleaning head for screen printing machines
WGCM the first web cleaner for reel to reel process
CM20 the first bare board cleaner for SMT
The first sheeted adhesive
The “ECO” adhesive
Nanocleen™ roller and adhesive First silicon-free cleaning system
HVCC – first high vacuum cleaner certified to operate in high vacuum
DLCC First dual lane SMT cleaner
UTF – First controlled “Surface” cleaning roller
Nanocleen™ 20.20 – First roller to meet ANSI/ESD s20.20 2014
NT™ First silicone roller to meet ANSI/ESD s20.20
SMT-II a new benchmark in SMT board cleaning. With Low Static Cleaning and Low Applied Pressure
New 5,000sqm purpose-built facility opens
Teknek Japan opens
Teknek Hong Kong opens
Research & Development laboratories open
First company to make all cleaning rollers to ISO 6261 Class A
Teknek certified ISO 9000:2015
IQ Surf partner Dupont
Clean 4 Yield OLED/OPV Holst Institute
Matteucci Award Best Paper at AMICAL
Prosurf Fraunhofer Institute
Methods for Optical Film Cleaning University of Huddersfield
Win The Best Cleaning Equipment Award at SH NEPCON
SMT 2017 Machine received SMT China Award of 'The Best Cleaning Machine' at SH NEPCON, China
SMT 2017 win the Title of 'EM Asia Innovation Award -- The Best Cleaning Machine'
SMT 2017 Wins the Title of ‘Innovation Award’, which presented by SMTA