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About Us

Hello, we are Teknek. We have been dedicated to solving customer contamination problems for over 30 years. Our business is entirely focused on researching, developing, producing and servicing contact cleaning equipment. We invented the Technology and have through innovation and service managed to remain at the forefront of this sector. Our aim is simple - zero defects in your process.


1980

The first DCR hand roller

1981

The first Clean Machine

1984

PC600 The first PCB machine

2003

The first sheeted adhesive

2005

The “ECO” adhesive

2009

Nanocleen™ roller and adhesive First silicon-free cleaning system

2014

DLCC First dual lane SMT cleaner

2014

HVCC – first high vacuum cleaner certified to operate in high vacuum

2015

UTF – First controlled “Surface” cleaning roller

2016

Nanocleen™ 20.20 – First roller to meet ANSI/ESD s20.20 2014

1999

New 5,000sqm purpose-built facility opens

2001

Teknek Japan opens

2004

Teknek Hong Kong opens

2007

Research & Development laboratories open

2010

First Cleaning Roller Production Facility to meet ISO6261 Class A

2016

Teknek certified ISO 9000:2015

2000

IQ Surf partner Dupont

2013

Clean 4 Yield OLED/OPV Holst Institute

2015

Matteucci Award Best Paper at AMICAL

2016

Prosurf Fraunhofer Institute

2016

Methods for Optical Film Cleaning University of Huddersfield